SisuSemi is revolutionizing semiconductor device fabrication with innovative solutions that boost yield, enhance reliability, and extend component lifetimes. Our cutting-edge technology achieves atomic-level cleanliness and passivation, bringing unparalleled precision to life.
We specialize in providing advanced semiconductor process solutions and services tailored for Integrated Device Manufacturers (IDMs), Foundries, and Fabless companies. Our expertise spans various application areas, ensuring high performance and reliability.
Our technology is rooted in robust material research from Finland, encompassing nanomaterials, renewable energy materials, smart materials, and sustainable materials development. The first patents protecting SisuSemi technology date back to 2015.
The inventors of these technologies are actively involved in SisuSemis research and development activities. Today, SisuSemi is the sole entity exploiting these patents, with a strong patent portfolio that effectively protects our business globally.
𝗪𝗵𝗮𝘁 𝗪𝗲 𝗢𝗳𝗳𝗲𝗿:
• Cutting-edge cleaning methods that provide atomic-level cleanliness and crystal structure.
• Crystalline SiO₂ film as a passivation layer without surface defects. This layer can be further enhanced with additional layers using techniques like ALD.
With reduced surface defects and a robust passivation layer, SisuSemi’s technology offers e.g. the following 𝗞𝗲𝘆 𝗕𝗲𝗻𝗲𝗳𝗶𝘁𝘀:
• Enhanced performance and efficiency
• Improved yield
• Enabling technology for advanced applications
Join us in shaping the future of technology with our state-of-the-art semiconductor solutions.
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